Is PMMA a resist?
PMMA is most commonly used as a high resolution positive resist for direct write e-beam offering extremely high-resolution, ease of handling and excellent film characteristics.
Is PMMA a positive resist?
Poly(methylmethacrylate) (PMMA) which is commonly used as a positive resist can also be used in a negative manner with exposure at higher dose levels.
How to dilute PMMA?
Before starting, calculate exactly how much resist and thinner you’ll need to get to your desired quantity and dilution. For example, to make 100 mL of A2 PMMA you’d need 20 mL of A10 PMMA and 80 mL of anisole/A Thinner, assuming equal densities.
How do you develop PMMA?
Bake PMGI on a hot plate at a temperature of 250-275°C for 10-15 minutes. Spin PMMA to a thickness of at least 50 nm on top of the PMGI. Thinner PMMA will give higher resolution while thicker PMMA will make the pattern more durable during development and evaporation.
Is PMMA UV stable?
PMMA is UV stable and has very good weather resistance, making it suitable for outdoor use. The electrical properties are also good.
Why is PMMA UV resistant?
At UV wavelengths shorter than 300 nm PMMA undergoes sufficient chain scission that it can be used as a positive resist with strong (high intensity) UV sources.
Is PMMA negative resist?
PMMA is a high resolution positive resist that is often used with our copolymer materials in bi-layer and tri-layer schemes for metal deposition and T-gates. ma-N 2400 is a high resolution, negative DUV/e-beam resist.
What is the best solvent for PMMA?
PMMA polymers, can be dissolved in all: Tolune, Dichloromethane, Chloroform, and Acetone. You must use the casting techniques to prepare the samples. The best solvent for PMMA should be either toluene or acetone.
Is PMMA water soluble?
PMMA is insoluble in both pure water and ethanol at ambient temperature. …
What is PMMA lithography?
Polymethyl methacrylate (PMMA) is widely used in micro. and nanofabrication as a very high resolution resist. It is. extensively used for both electron beam lithography [1–3] and. for x-ray lithography [4, 5].
Does IPA remove PMMA?
Cleaning with isopropanol will remove macroscopic PMMA residues.
Does PMMA scratch easily?
It can retain its properties over a long period of time even when exposed to UV rays and weather. In addition, PMMA is scratch resistant. Glass tends to be delicate as it scratches and breaks easily.
What is electron beam resist?
E-beam resists (electron beam resists) are designed for electron beam and deep UV applications for the fabrication of highly integrated circuits, mainly for mask fabrication. These resists generally allow the realisation of 100 to 500 nm structures on masks and wafers with film thickness values between 200 and 500 nm.
What is acrylic PMMA used for?
PMMA or acrylic is a widely used transparent plastic material known for its applications in various markets from car windows, smartphone screens to aquariums. It is a tough plastic, easy to shape and a great alternative to the high cost and less resilient glass.
What can dissolve PMMA?
How do I get rid of PMMA?
Hot (50°C) acetone treatment can weaken the PMMA film within 1 hour. Cleaning with isopropanol will remove macroscopic PMMA residues. This step is followed by annealing at 400°C (or higher) under Ar or Ar/H2(10%) flow and very low pressure.
Does PMMA dissolve in acetone?
The polymethyl methacrylate is dissolved in acetone and the mix is agitated, sometimes even raising the temperature to 30-40 °C.
What does PMMA 495 mean?
PMMA (Polymethyl methacrylate) is a positive resist used for direct electron beam writing and as a polymeric coating for wafers. 495 indicates that the PMMA is of molecular weight 495K. Substrate should be clean and dry, oxygen plasma can be used as well as solvents such as acetone and isopropanol alcohol (IPA). Dry using a nitrogen gun
How are PMMA and copolymer resists developed?
PMMA and copolymer resists can be developed using immersion (21°C), spray puddle and spray process techniques. The process conditions that are selected, such as resist selection, baking conditions, exposure conditions and development conditions, should be selected to optimise the desired results.
What are the recommended coating conditions for PMMA coating?
The recommended coating conditions are: (1) Dispense: STATIC 5 – 8ml for a 150mm wafer (2) Spread: DYNAMIC 500 rpm for 5 sec OR STATIC 0 rpm for 10 sec (3) Spin: Ramp to final spin speed at a high acceleration rate and hold for a total of 45 seconds. Pre Bake PMMA Hot plate: 180oC for 60 – 90 sec OR Convection Oven: 170oC for 30 min
Why choose Microchem PMMA resist coating?
MicroChem PMMA resists produce low defect coatings over a broad range of film thicknesses. The film thickness vs. spin-speed curves displayed in Fig. 1 through 8 provide the information required to select the appropriate PMMA dilution and spin speed needed to